SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - High-index optical materials for 193nm immersion lithography

✍ Scribed by Burnett, John H.; Kaplan, Simon G.; Shirley, Eric L.; Horowitz, Deane; Clauss, Wilfried; Grenville, Andrew; Van Peski, Chris; Flagello, Donis G.

• Book ID: 118247324
• Publisher: SPIE
• Year: 2006
• Weight: 554 KB
• Volume: 6154
• Category: Article
• DOI: 10.1117/12.656901