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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Methods for benchmarking photolithography simulators: part IV

✍ Scribed by Graves, Trey; Smith, Mark D.; Mack, Chris A.; Flagello, Donis G.

Book ID: 120216292
Publisher: SPIE
Year: 2006
Weight: 610 KB
Volume: 6154
Category: Article
DOI: 10.1117/12.660031

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