✦ LIBER ✦

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Customized illumination shapes for 193nm immersion lithography

✍ Scribed by Ling, Moh Lung; Chua, Gek Soon; Lin, Qunying; Tay, Cho Jui; Quan, Chenggen; Levinson, Harry J.; Dusa, Mircea V.

No coin nor oath required. For personal study only.

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