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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Understanding illumination effects for control of optical proximity effects (OPE)

✍ Scribed by Flagello, Donis G.; Geh, Bernd; Socha, Robert; Liu, Peng; Cao, Yu; Stas, Roland; Natt, Oliver; Zimmermann, Jörg; Levinson, Harry J.; Dusa, Mircea V.

Book ID: 121372390
Publisher: SPIE
Year: 2008
Weight: 461 KB
Volume: 6924
Category: Article
DOI: 10.1117/12.773632

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