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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Understanding illumination effects for control of optical proximity effects (OPE)

✍ Scribed by Flagello, Donis G.; Geh, Bernd; Socha, Robert; Liu, Peng; Cao, Yu; Stas, Roland; Natt, Oliver; Zimmermann, Jörg; Levinson, Harry J.; Dusa, Mircea V.


Book ID
121372390
Publisher
SPIE
Year
2008
Weight
461 KB
Volume
6924
Category
Article

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