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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Evaluating the accuracy of a calibrated rigorous physical resist model under various process and illumination conditions

โœ Scribed by Robertson, Stewart A.; Kim, Byung-Sung; Choi, Woon-Hyuk; Kim, Yoo-Hyon; Biafore, John J.; Smith, Mark D.; Levinson, Harry J.; Dusa, Mircea V.


Book ID
120032401
Publisher
SPIE
Year
2008
Weight
535 KB
Volume
6924
Category
Article

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