SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Evaluating the accuracy of a calibrated rigorous physical resist model under various process and illumination conditions

✍ Scribed by Robertson, Stewart A.; Kim, Byung-Sung; Choi, Woon-Hyuk; Kim, Yoo-Hyon; Biafore, John J.; Smith, Mark D.; Levinson, Harry J.; Dusa, Mircea V.

• Book ID: 120032401
• Publisher: SPIE
• Year: 2008
• Weight: 535 KB
• Volume: 6924
• Category: Article
• DOI: 10.1117/12.772766