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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Fitness and runtime correlation of compact model complexity

✍ Scribed by Drozdov, Alexander N.; Kempsell, Monica L.; Granik, Yuri; Levinson, Harry J.; Dusa, Mircea V.

No coin nor oath required. For personal study only.

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