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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Optical Microlithography XXVI - Model of freeform illumination mode and polarization mode for 193nm immersion lithographic machine

✍ Scribed by Zhang, Yunbo; Zeng, Aijun; Wang, Ying; Chen, Mingxing; Huang, Huijie; Conley, Will

Book ID: 121492582
Publisher: SPIE
Year: 2013
Weight: 554 KB
Volume: 8683
Category: Article
DOI: 10.1117/12.2011517

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