𝔖 Bobbio Scriptorium

✦ LIBER ✦

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

✍ Scribed by Lemaillet, P.; Germer, T. A.; Kline, R. Joseph; Sunday, Daniel F.; Wang, Chengqing; Wu, Wen-li; Starikov, Alexander; Cain, Jason P.

Book ID: 120255403
Publisher: SPIE
Year: 2013
Weight: 898 KB
Volume: 8681
Category: Article
DOI: 10.1117/12.2011144

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Fin stress and pitch measurement using X-ray diffraction reciprocal space maps and optical scatterometry

✍ Diebold, A. C.; Medikonda, M.; Muthinti, G. R.; Kamineni, V. K.; Fronheiser, J.; 📂 Article 📅 2013 🏛 SPIE ⚖ 248 KB

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Systematic errors in the measurement of power spectral density

✍ Mack, Chris A.; Starikov, Alexander; Cain, Jason P. 📂 Article 📅 2013 🏛 SPIE ⚖ 832 KB

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Introduction of a high throughput SPM for defect inspection and process control

✍ Sadeghian, H.; Koster, N. B.; van den Dool, T. C.; Starikov, Alexander; Cain, Ja 📂 Article 📅 2013 🏛 SPIE ⚖ 500 KB

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - 22 nm node wafer inspection using diffraction phase microscopy and image post-processing

✍ Zhou, Renjie; Popescu, Gabriel; Goddard, Lynford L.; Starikov, Alexander; Cain, 📂 Article 📅 2013 🏛 SPIE ⚖ 971 KB

SPIE Proceedings [SPIE Advanced Lithogra

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Application of perturbation methods in optical scatterometry

✍ Bergner, B. C.; Suleski, T. J.; Archie, Chas N. 📂 Article 📅 2007 🏛 SPIE ⚖ 720 KB

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Nanoparticle size and shape evaluation using the TSOM method

✍ Damazo, Bradley; Attota, Ravikiran; Kavuri, Purushotham; Vladár, András E.; Star 📂 Article 📅 2012 🏛 SPIE ⚖ 575 KB