SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Fin stress and pitch measurement using X-ray diffraction reciprocal space maps and optical scatterometry

✍ Scribed by Diebold, A. C.; Medikonda, M.; Muthinti, G. R.; Kamineni, V. K.; Fronheiser, J.; Wormington, M.; Peterson, B.; Race, J.; Starikov, Alexander; Cain, Jason P.

• Book ID: 121513114
• Publisher: SPIE
• Year: 2013
• Weight: 248 KB
• Volume: 8681
• Category: Article
• DOI: 10.1117/12.2023081