SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Sub-50-nm measurements using a 193-nm angle-resolved scatterfield microscope

✍ Scribed by Quintanilha, R.; Sohn, Y. J.; Barnes, B. M.; Silver, R.; Raymond, Christopher J.

• Book ID: 121483148
• Publisher: SPIE
• Year: 2010
• Weight: 1001 KB
• Volume: 7638
• Category: Article
• DOI: 10.1117/12.846383