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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Electron-beam induced photoresist shrinkage influence on 2D profiles

✍ Scribed by Bunday, Benjamin; Cordes, Aaron; Allgair, John; Aguilar, Daniel Bellido; Tileli, Vasiliki; Thiel, Bradley; Avitan, Yohanan; Peltinov, Ram; Bar-Zvi, Mayaan; Adan, Ofer; Chirko, Konstantin; Raymond, Christopher J.

Book ID: 115518710
Publisher: SPIE
Year: 2010
Weight: 859 KB
Volume: 7638
Category: Article
DOI: 10.1117/12.846991

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