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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - A slim column cell of 12nm resolution for wider application of e-beam lithography

✍ Scribed by Yamada, Akio; Tong, William M.; Resnick, Douglas J.; Tanaka, Hitoshi; Abe, Tomohiko; Shimizu, Youichi

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