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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advanced Etch Technology for Nanopatterning II - Characteristics of selective PMMA etching for forming a PS mask

✍ Scribed by Satake, M.; Iwase, T.; Kurihara, M.; Negishi, N.; Tada, Y.; Yoshida, H.; Zhang, Ying; Oehrlein, Gottlieb S.; Lin, Qinghuang

Book ID: 120546555
Publisher: SPIE
Year: 2013
Weight: 314 KB
Volume: 8685
Category: Article
DOI: 10.1117/12.2011071

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