SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Development of maskless electron-beam lithography using nc-Si electron-emitter array

✍ Scribed by Kojima, A.; Tong, William M.; Resnick, Douglas J.; Ikegami, N.; Yoshida, T.; Miyaguchi, H.; Muroyama, M.; Noshino, H.; Yoshida, S.; Sugata, M.; Cakir, S.; Ohyi, H.; Koshida, N.; Esashi, M.

• Book ID: 120444656
• Publisher: SPIE
• Year: 2013
• Weight: 728 KB
• Volume: 8680
• Category: Article
• DOI: 10.1117/12.2011553