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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Reflective electron-beam lithography: progress toward high-throughput production capability

✍ Scribed by Freed, Regina; Gubiotti, Thomas; Sun, Jeff; Kidwingira, Francoise; Yang, Jason; Ummethala, Upendra; Hale, Layton C.; Hench, John J.; Kojima, Shinichi; Mieher, Walter D.; Bevis, Chris F.; Lin, Shy-Jay; Wang, Wen-Chuan; Tong, William M.

Book ID: 121324508
Publisher: SPIE
Year: 2012
Weight: 826 KB
Volume: 8323
Category: Article
DOI: 10.1117/12.916090

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