SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements

✍ Scribed by Tiron, R.; Chevalier, X.; Gaugiran, S.; Pradelles, J.; Fontaine, H.; Couderc, C.; Pain, L.; Navarro, C.; Chevolleau, T.; Cunge, G.; Delalande, M.; Fleury, G.; Hadziioannou, G.; Tong, William M.

• Book ID: 120992277
• Publisher: SPIE
• Year: 2012
• Weight: 934 KB
• Volume: 8323
• Category: Article
• DOI: 10.1117/12.916400