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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Designing new materials and processes for directed self-assembly applications

✍ Scribed by Chang, Shih-Wei; Vogel, Erin E.; Ginzburg, Valeriy V.; Murray, Daniel J.; Kramer, John W.; Weinhold, Jeffrey D.; Chuang, Vivian P. W.; Sharma, Rahul; Evans, Jessica P.; Landes, Brian; Ge, Shouren; Trefonas, Peter; Hustad, Phillip D.; Tong, William M.

Book ID: 120822796
Publisher: SPIE
Year: 2012
Weight: 620 KB
Volume: 8323
Category: Article
DOI: 10.1117/12.916429

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