SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Optimization of BSE-detector for e-beam direct write lithography

✍ Scribed by Alves, H.; Hahmann, P.; Slodowski, M.; Frase, C. G.; Gnieser, D.; Johnsen, K.-P.; Bosse, H.; Schellenberg, Frank M.; La Fontaine, Bruno M.

• Book ID: 121460726
• Publisher: SPIE
• Year: 2009
• Weight: 407 KB
• Volume: 7271
• Category: Article
• DOI: 10.1117/12.814156