SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - E-beam direct write alignment strategies for the next generation node

✍ Scribed by Alves, H.; Hahmann, P.; Kliem, K.-H.; Weidenmueller, U.; Jahr, S.; Frase, C. G.; Gnieser, D.; Bosse, H.; Zimmermann, R.; Arndt, C.; Schellenberg, Frank M.

• Book ID: 120991583
• Publisher: SPIE
• Year: 2008
• Weight: 473 KB
• Volume: 6921
• Category: Article
• DOI: 10.1117/12.771585