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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions

✍ Scribed by Houle, Frances A.; Fornof, Ann; Miller, Dolores C.; Raoux, Simone; Truong, Hoa; Simonyi, Eva; Jahnes, Christopher; Rossnagel, Stephen; Schellenberg, Frank M.

Book ID: 120819332
Publisher: SPIE
Year: 2008
Weight: 201 KB
Volume: 6921
Category: Article
DOI: 10.1117/12.772591

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