SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Gate edge roughness in electron beam direct write and its influence to device characteristics

✍ Scribed by Choi, Kang-Hoon; Dittrich, Rok; Goldbach, Matthias; Hohle, Christoph; Keil, Katja; Marschner, Thomas; Tesauro, Mark; Thrum, Frank; Zimmermann, Roy; Kretz, Johannes; Schellenberg, Frank M.

• Book ID: 121417682
• Publisher: SPIE
• Year: 2008
• Weight: 582 KB
• Volume: 6921
• Category: Article
• DOI: 10.1117/12.772649