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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characterization of vinyl ether UV-cure nanoimprint resist

✍ Scribed by Furukawa, Taiichi; Houle, Frances A.; Casher, Deborah L.; Miller, Dolores C.; Schellenberg, Frank M.; La Fontaine, Bruno M.

Book ID: 118151672
Publisher: SPIE
Year: 2009
Weight: 188 KB
Volume: 7271
Category: Article
DOI: 10.1117/12.813065

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