SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - In situ measurement of annealing-induced line shape evolution in nanoimprinted polymers using scatterometry

✍ Scribed by Patrick, Heather J.; Germer, Thomas A.; Ding, Yifu; Ro, Hyun Wook; Richter, Lee J.; Soles, Christopher L.; Schellenberg, Frank M.; La Fontaine, Bruno M.

• Book ID: 120331234
• Publisher: SPIE
• Year: 2009
• Weight: 436 KB
• Volume: 7271
• Category: Article
• DOI: 10.1117/12.815360