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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Imaging budgets for EUV optics: ready for 22-nm node and beyond

✍ Scribed by Bienert, Marc; Göhnemeier, Aksel; Natt, Oliver; Lowisch, Martin; Gräupner, Paul; Heil, Tilmann; Garreis, Reiner; van Ingen Schenau, Koen; Hansen, Steve; Schellenberg, Frank M.; La Fontaine, Bruno M.

Book ID: 120185171
Publisher: SPIE
Year: 2009
Weight: 492 KB
Volume: 7271
Category: Article
DOI: 10.1117/12.814185

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