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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Litho and patterning challenges for memory and logic applications at the 22-nm node

✍ Scribed by Finders, Jo; Dusa, Mircea; Nikolsky, Peter; van Dommelen, Youri; Watso, Robert; Vandeweyer, Tom; Beckaert, Joost; Laenens, Bart; Van Look, Lieve; Dusa, Mircea V.; Conley, Will

Book ID: 120220603
Publisher: SPIE
Year: 2010
Weight: 653 KB
Volume: 7640
Category: Article
DOI: 10.1117/12.848330

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