✦ LIBER ✦
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell
✍ Scribed by Ban, Yongchan; Ma, Yuansheng; Levinson, Harry J.; Deng, Yunfei; Kye, Jongwook; Pan, David Z.; Rieger, Michael L.; Thiele, Joerg
- Book ID
- 120017994
- Publisher
- SPIE
- Year
- 2010
- Weight
- 995 KB
- Volume
- 7641
- Category
- Article
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