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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Roadmap to sub-nanometer OPC model accuracy

✍ Scribed by Sturtevant, John L.; Tejnil, Edita; Kato, Kokoro

Book ID: 120032409
Publisher: SPIE
Year: 2012
Weight: 871 KB
Volume: 8441
Category: Article
DOI: 10.1117/12.978190

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