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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - CD-Metrology of EUV masks in the presence of charging: measurement and simulation

✍ Scribed by Babin, Sergey; Borisov, Sergey; Hakii, Hidemitsu; Nishiyama, Yasushi; Yonekura, Isao; Kato, Kokoro

Book ID: 120015129
Publisher: SPIE
Year: 2012
Weight: 766 KB
Volume: 8441
Category: Article
DOI: 10.1117/12.999462

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