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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Pore size control of alumina membrane mask

✍ Scribed by Ting, Yung-Chiang; Shy, Shyi-Long; Hoga, Morihisa

Book ID: 121363485
Publisher: SPIE
Year: 2006
Weight: 633 KB
Volume: 6283
Category: Article
DOI: 10.1117/12.681837

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