SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)

✍ Scribed by Yoon, Si-Yeul; Choi, Se-Jong; Kim, Yong-Dae; Lee, Dong-Hyuk; Cha, Han-Sun; Kim, Jin-Min; Choi, Sang-Soo; Jeong, Soo Hong; Kawahira, Hiroichi

• Book ID: 120423701
• Publisher: SPIE
• Year: 2002
• Weight: 862 KB
• Volume: 4754
• Category: Article
• DOI: 10.1117/12.476952