SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - A study of applications scribe frame data verifications using design rule check

✍ Scribed by Saito, Shoko; Miyazaki, Masaru; Sakurai, Mitsuo; Itoh, Takahisa; Doi, Kazumasa; Sakurai, Norioko; Okada, Tomoyuki; Kato, Kokoro

• Book ID: 120992273
• Publisher: SPIE
• Year: 2013
• Weight: 511 KB
• Volume: 8701
• Category: Article
• DOI: 10.1117/12.2028330