SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - A systematic approach for extracting verification patterns from an OPC test mask

✍ Scribed by Kamel, Mohammad K. A.; Al-Imam, Mohamed; Kato, Kokoro

• Book ID: 120032408
• Publisher: SPIE
• Year: 2012
• Weight: 621 KB
• Volume: 8441
• Category: Article
• DOI: 10.1117/12.977202