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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Assist feature printability prediction by 3-D resist profile reconstruction

✍ Scribed by Zheng, Xin; Huang, Jensheng; Chin, Fook; Kazarian, Aram; Kuo, Chun-Chieh; Kato, Kokoro

No coin nor oath required. For personal study only.

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