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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Simulation of dry etch profile dynamics and CD variation due to microloading

✍ Scribed by Babin, S.; Bay, K.; Okulovsky, S.; Hoga, Morihisa

Book ID: 120493763
Publisher: SPIE
Year: 2006
Weight: 688 KB
Volume: 6283
Category: Article
DOI: 10.1117/12.681753

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