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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - 65nm mask CD qualification on critical features through simulation based lithography verification

✍ Scribed by van Adrichem, Paul J. M.; Valadez, John; Ziger, David; Gerold, Dave; Komuro, Masanori

Book ID: 121011497
Publisher: SPIE
Year: 2005
Weight: 143 KB
Volume: 5853
Category: Article
DOI: 10.1117/12.617519

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