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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Increasing the predictability of AIMS measurements by coupling to resist simulations

✍ Scribed by Meliorisz, Balint; Erdmann, Andreas; Schnattinger, Thomas; Ströβner, Ulrich; Scherübl, Thomas; De Bisschop, Peter; Philipsen, Vicky; Horiuchi, Toshiyuki

Book ID: 120829156
Publisher: SPIE
Year: 2008
Weight: 893 KB
Volume: 7028
Category: Article
DOI: 10.1117/12.793098

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