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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants

✍ Scribed by Lee, Kwangjoo; Kunjappu, Joy; Jockusch, Steffen; Turro, Nicholas J.; Widerschpan, Tatjana; Zhou, Jianming; Smith, Bruce W.; Zimmerman, Paul; Conley, Will; Sturtevant, John L.

Book ID: 120384474
Publisher: SPIE
Year: 2005
Weight: 169 KB
Volume: 5753
Category: Article
DOI: 10.1117/12.606105

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