SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Quantification of EUV resist outgassing

✍ Scribed by Yueh, Wang; Cao, Heidi B.; Thirumala, Vani; Choi, Hokkin; Sturtevant, John L.

• Book ID: 120446515
• Publisher: SPIE
• Year: 2005
• Weight: 189 KB
• Volume: 5753
• Category: Article
• DOI: 10.1117/12.600540