SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

✍ Scribed by Teramoto, Yusuke; Sato, Hiroto; Bessho, Kazunori; Niimi, Gohta; Shirai, Takahiro; Yamatani, Daiki; Takemura, Tetsu; Yokota, Toshio; Paul, Khokan C.; Kabuki, Kiyoyuki; Miyauchi, Koji; Ikeuchi, Mitsuru; Hotta, Kazuaki; Yoshioka, Masaki; Toyoda, Koichi; Mackay, R. Scott

• Book ID: 120586822
• Publisher: SPIE
• Year: 2005
• Weight: 257 KB
• Volume: 5751
• Category: Article
• DOI: 10.1117/12.602021