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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Silicon backbone polymers as EUV resists

✍ Scribed by Bravo-Vasquez, Juan Pablo; Kwark, Young-Je; Ober, Christopher K.; Cao, Heidi B.; Deng, Hai; Meagley, Robert P.; Sturtevant, John L.

Book ID: 121200790
Publisher: SPIE
Year: 2004
Weight: 208 KB
Volume: 5376
Category: Article
DOI: 10.1117/12.536438

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