✦ LIBER ✦

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Simulation of energy deposition for scattering electrons in resist layer

✍ Scribed by Tao, Yousong; Zhang, Yulin; Li, Dayao; Sturtevant, John L.

No coin nor oath required. For personal study only.

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