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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Critical dimension control in 90nm - 65nm node

✍ Scribed by Terashita, Yuichi; Shizukuishi, Mamoko; Shite, Hideo; Kyoda, Hideharu; Oshima, Kazuhiko; Yoshihara, Kosuke; Sturtevant, John L.

Book ID: 121010114
Publisher: SPIE
Year: 2004
Weight: 477 KB
Volume: 5376
Category: Article
DOI: 10.1117/12.534997

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