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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

✍ Scribed by Bunday, Benjamin D.; Bishop, Michael; Allgair, John A.; Silver, Richard M.

Book ID: 121011496
Publisher: SPIE
Year: 2004
Weight: 287 KB
Volume: 5375
Category: Article
DOI: 10.1117/12.535960

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