SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance

✍ Scribed by Patterson, Kyle; Sturtevant, John L.; Alvis, John R.; Benavides, Nancy; Bonser, Douglas; Cave, Nigel; Nelson-Thomas, Carla; Taylor, William D.; Turnquest, Karen L.; Sullivan, Neal T.

• Book ID: 120497408
• Publisher: SPIE
• Year: 2001
• Weight: 104 KB
• Volume: 4344
• Category: Article
• DOI: 10.1117/12.436808