✦ LIBER ✦
SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography
✍ Scribed by Yune, Hyoung-Soon; Kim, Hee-Bom; Kim, Wan-Ho; Ahn, Chang-Nam; Ham, Young-Mog; Shin, Ki-Soo; Progler, Christopher J.
- Book ID
- 120383777
- Publisher
- SPIE
- Year
- 2001
- Weight
- 909 KB
- Volume
- 4346
- Category
- Article
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