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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Characterization of a positive chemically amplified photoresist for process control

✍ Scribed by Jakatdar, Nickhil H.; Niu, Xinhui; Spanos, Costas J.; Romano, Andrew R.; Bendik, Joseph J.; Kovacs, Ronald P.; Hill, Stephen L.; Singh, Bhanwar

Book ID: 118128807
Publisher: SPIE
Year: 1998
Weight: 581 KB
Volume: 3332
Category: Article
DOI: 10.1117/12.308771

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