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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Understanding the forbidden pitch phenomenon and assist feature placement

โœ Scribed by Shi, Xuelong; Hsu, Stephen; Chen, J. Fung; Hsu, Chungwei Michael; Socha, Robert J.; Dusa, Mircea V.; Herr, Daniel J. C.


Book ID
120524057
Publisher
SPIE
Year
2002
Weight
883 KB
Volume
4689
Category
Article

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