𝔖 Bobbio Scriptorium

✦ LIBER ✦

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Understanding the forbidden pitch phenomenon and assist feature placement

✍ Scribed by Shi, Xuelong; Hsu, Stephen; Chen, J. Fung; Hsu, Chungwei Michael; Socha, Robert J.; Dusa, Mircea V.; Herr, Daniel J. C.

Book ID: 120524057
Publisher: SPIE
Year: 2002
Weight: 883 KB
Volume: 4689
Category: Article
DOI: 10.1117/12.473427

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Fundamental solutions for real-time optical CD metrology

✍ Opsal, Jon L.; Chu, Hanyou; Wen, Youxian; Chang, Yia-Chung; Li, Guangwei; Herr, 📂 Article 📅 2002 🏛 SPIE ⚖ 401 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Overlay accuracy in 0.18-μm copper dual-damascene process

✍ Schulz, Bernd; Levinson, Harry J.; Seltmann, Rolf; Seligson, Joel L.; Izikson, P 📂 Article 📅 2002 🏛 SPIE ⚖ 127 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Gate line-edge roughness effects in 50-nm bulk MOSFET devices

✍ Xiong, Shiying; Bokor, Jeffrey; Xiang, Qi; Fisher, Philip; Dudley, Ian M.; Rao, 📂 Article 📅 2002 🏛 SPIE ⚖ 197 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Comparison of measured optical image profiles of silicon lines with two different theoretical models

✍ Silver, Richard M.; Attota, Ravikiran; Stocker, M.; Jun, Jau-Shi J.; Marx, Egon; 📂 Article 📅 2002 🏛 SPIE ⚖ 770 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches

✍ Kim, Keeho; Choi, Yong-Seok; Socha, Robert J.; Flagello, Donis G.; Yen, Anthony 📂 Article 📅 2002 🏛 SPIE ⚖ 101 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Evaluation and characterization of flare in ArF lithography

✍ Litt, Lloyd C.; Bourov, Anatoly; La Fontaine, Bruno M.; Apelgren, Eric M.; Yen, 📂 Article 📅 2002 🏛 SPIE ⚖ 114 KB