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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches

✍ Scribed by Kim, Keeho; Choi, Yong-Seok; Socha, Robert J.; Flagello, Donis G.; Yen, Anthony

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