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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Hopkins versus Abbe': a lithography simulation matching study

✍ Scribed by Schlief, Ralph E.; Liebchen, Armin; Chen, J. Fung; Yen, Anthony

No coin nor oath required. For personal study only.

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