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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Overlay accuracy in 0.18-μm copper dual-damascene process

✍ Scribed by Schulz, Bernd; Levinson, Harry J.; Seltmann, Rolf; Seligson, Joel L.; Izikson, Pavel; Ronen, Anat; Herr, Daniel J. C.


Book ID
121011491
Publisher
SPIE
Year
2002
Weight
127 KB
Volume
4689
Category
Article

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