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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Overlay accuracy in 0.18-μm copper dual-damascene process

✍ Scribed by Schulz, Bernd; Levinson, Harry J.; Seltmann, Rolf; Seligson, Joel L.; Izikson, Pavel; Ronen, Anat; Herr, Daniel J. C.

Book ID: 121011491
Publisher: SPIE
Year: 2002
Weight: 127 KB
Volume: 4689
Category: Article
DOI: 10.1117/12.473477

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